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1. Identity statement
Reference TypeJournal Article
Sitemtc-m21b.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identifier8JMKD3MGP3W34P/3LRA2BH
Repositorysid.inpe.br/mtc-m21b/2016/06.07.16.28   (restricted access)
Last Update2016:06.07.16.28.52 (UTC) administrator
Metadata Repositorysid.inpe.br/mtc-m21b/2016/06.07.16.28.16
Metadata Last Update2018:06.04.02.40.53 (UTC) administrator
DOI10.1134/S102745101603037X
ISSN1027-4510
Citation KeyZiminAmGoNaAbRa:2016:PlSpPb
TitlePlasma sputtering of Pb1–x Eu x Te films with varied composition and structure
Year2016
MonthMay
Access Date2024, May 18
Type of Workjournal article
Secondary TypePRE PI
Number of Files1
Size945 KiB
2. Context
Author1 Zimin, S. P.
2 Amirov, I. I.
3 Gorlachev, E. S.
4 Naumov, V. V.
5 Abramof, Eduardo
6 Rappl, Paulo Henrique de Oliveira
Resume Identifier1
2
3
4
5 8JMKD3MGP5W/3C9JGUH
6 8JMKD3MGP5W/3C9JJ37
Group1
2
3
4
5 LAS-CTE-INPE-MCTI-GOV-BR
6 LAS-CTE-INPE-MCTI-GOV-BR
Affiliation1 Demidov State University
2 Russian Academy of Sciences
3 Russian Academy of Sciences
4 Russian Academy of Sciences
5 Instituto Nacional de Pesquisas Espaciais (INPE)
6 Instituto Nacional de Pesquisas Espaciais (INPE)
Author e-Mail Address1 zimin@uniyar.ac.ru
2
3
4
5 eduardo.abramof@inpe.br
6 paulo.rappl@inpe.br
JournalJournal of Surface Investigation: X-ray, Synchroton and Neutron Techniques
Volume10
Number3
Pages623-626
History (UTC)2016-06-07 16:28:53 :: simone -> administrator :: 2016
2018-06-04 02:40:53 :: administrator -> simone :: 2016
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
Version Typepublisher
Keywordslead chalcogenides
molecular-beam epitaxy
films
high-frequency inductively coupled argon plasma
plasma surface treatment
AbstractWe investigate the sputtering of single-crystal and polycrystalline films of Pb1x Eu x Te (x = 0.020.10) in high-frequency inductively coupled argon plasma. Layers of Pb1x Eu x Te are grown via molecular beam epitaxy on barium-fluoride substrates of the (111) orientation at 340 and 200°C. For single-crystal films, the dependence of the sputtering rate on the europium concentration is found. For polycrystalline layers, a decrease in the sputtering rate is observed. This is caused by the effect of europium oxidation at the surface of the polycrystallites.
AreaFISMAT
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Plasma sputtering of...
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4. Conditions of access and use
Languageen
User Groupself-uploading-INPE-MCTI-GOV-BR
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Reader Groupadministrator
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Visibilityshown
Archiving Policydenypublisher allowfinaldraft
Read Permissiondeny from all and allow from 150.163
Update Permissionnot transferred
5. Allied materials
LinkingTrabalho não Vinculado à Tese/Dissertação
Mirror Repositoryurlib.net/www/2011/03.29.20.55
Next Higher Units8JMKD3MGPCW/3ESR3H2
Citing Item Listsid.inpe.br/mtc-m21/2012/07.13.14.57.50 2
sid.inpe.br/bibdigital/2013/09.24.19.30 2
sid.inpe.br/mtc-m21/2012/07.13.14.44.57 1
DisseminationWEBSCI; PORTALCAPES; SCOPUS.
Host Collectionsid.inpe.br/mtc-m21b/2013/09.26.14.25.20
6. Notes
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